Recent Advances in Polymer Based Atomic Oxygen Resistance Materials for Space Applications
Published: 2024
Author(s) Name: Narender Singh and Sonia Khanna |
Author(s) Affiliation: Dept. of Chemistry and Biochemistry, Sharda Univ., Greater Noida, Uttar Pradesh, India
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Abstract
In low Earth orbit (LEO), atomic oxygen (AO) presents a significant threat to spacecraft materials due to its highly reactive nature, especially with polymers and other organic compounds. AO exposure can cause surface erosion, mass loss, and reduced structural integrity, ultimately impacting spacecraft performance and longevity. This study examines recent developments in AO-resistant materials, focusing on different types of polymers and specially engineered polymer composites. Atomic oxygen-resistant coatings based on various polymeric systems that include fluorinated polymers, silicones, poly (carborane-siloxane)s, and decarborane-based polymers are discussed. Fluorine-containing polymers also show considerable promise due to their inherent chemical stability against AO. The study further explores innovative nanostructured and hybrid materials that offer a balance of mechanical strength and AO resistance and characterization techniques for the atomic oxygen resistance materials. By identifying and optimizing materials that withstand AO exposure, this research also explains about the methods of sensing of atomic oxygen based on satellite, ultimately contributing to more efficient and cost-effective space missions.
Keywords: Atomic oxygen, Characterization techniques, Low Earth orbit, Polyimide film, Siloxanes.
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